发明名称 Methods of Utilizing Block Copolymer to Form Patterns
摘要 Some embodiments include methods of forming patterns utilizing copolymer. A main body of copolymer may be formed across a substrate, and self-assembly of the copolymer may be induced to form a pattern of structures across the substrate. A uniform thickness throughout the main body of the copolymer may be maintained during the inducement of the self-assembly. In some embodiments, the uniform thickness may be maintained through utilization of a wall surrounding the main body of copolymer to impede dispersal of the copolymer from the main body. In some embodiments, the uniform thickness may be maintained through utilization of a volume of copolymer in fluid communication with the main body of copolymer.
申请公布号 US2014349486(A1) 申请公布日期 2014.11.27
申请号 US201414455583 申请日期 2014.08.08
申请人 Micron Technology, Inc. 发明人 Sills Scott E.;Millward Dan
分类号 H01L21/308;C08J5/00 主分类号 H01L21/308
代理机构 代理人
主权项
地址 Boise ID US
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