| 摘要 |
The present invention relates to a transparent conductive film and a method for producing a transparent conductive film. This transparent conductive film (10) comprises a transparent base (12) and a metal wiring part (14) that is formed on the transparent base (12), and a metal thin wire (24) that constitutes an electrode part (18) of the metal wiring part (14) has a surface configuration that satisfies Ra2/Sm > 0.01 μm and has a metal volume ratio of 35% or more. In this connection, Ra represents the arithmetic mean roughness that is not more than the thickness of the metal wiring at the measurement point of the surface roughness, and the unit thereof is μm; and Sm represents the mean spacing of profile irregularities, which is not less than 0.01 μm. |
