| 发明名称 |
LASER APPARATUS AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS |
| 摘要 |
A laser apparatus may include a master oscillator configured to output a pulse laser beam, at least one amplifier provided in a path of the pulse laser beam from the master oscillator, and at least one first optical isolator provided in the path of the pulse laser beam, the first optical isolator including at least one of a GaAs crystal and a CdTe crystal as an electro-optic crystal. |
| 申请公布号 |
US2014346376(A1) |
申请公布日期 |
2014.11.27 |
| 申请号 |
US201414455743 |
申请日期 |
2014.08.08 |
| 申请人 |
GIGAPHOTON INC. |
发明人 |
NOWAK Krzysztof;WAKABAYASHI Osamu |
| 分类号 |
H01S3/00;G02F1/03;H05G2/00;H01S3/11 |
主分类号 |
H01S3/00 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A laser apparatus, comprising:
a master oscillator configured to output a pulse laser beam; at least one amplifier provided in a path of the pulse laser beam from the master oscillator; and at least one first optical isolator provided in the path of the pulse laser beam, the first optical isolator including a GaAs crystal as an electro-optic crystal. |
| 地址 |
Oyama-shi JP |
