| 摘要 |
<p>According to the present invention, a control apparatus for a substrate deposition apparatus includes: a temperature detecting device to optically detect a temperature of a substrate deposited in a substrate deposition apparatus and a susceptor; a detected temperature calculation unit to calculate the temperature detected from the temperature detecting device into a temperature value; a region separation unit to separate a susceptor region and a substrate region based on the temperature value calculated from the detected temperature calculation unit; a substrate regional temperature calculation unit to calculate a regional temperature of the substrate based on the temperature of the substrate region separated from the region separation unit; a temperature comparison unit to compare the regional temperature of the substrate; and a bowing determination unit to determine a bowing of the substrate using a comparison result of the temperature comparison unit. The control apparatus for a substrate deposition apparatus in accordance to the present invention detects the temperature of the substrate and the susceptor using the temperature detection device, which detects the temperature of the substrate, for example, a pyrometer; and the bowing or the level of bowing of the substrate can be determined based on the detected temperature such that the temperature detection and the bowing determination of the substrate can be performed using one temperature detection apparatus without using separate apparatus, thereby reducing the manufacturing costs and simplifying the configuration.</p> |
