发明名称 |
FULLERENES |
摘要 |
The present disclosure relates to novel fullerene derivatives, positive and negative photoresist compositions prepared therefrom and methods of using them. The derivatives, their photoresist compositions and the methods are ideal for high speed, fine pattern processing using, for example, ultraviolet radiation, extreme ultraviolet radiation, beyond extreme ultraviolet radiation, X-rays, electron beam and other charged particle rays. |
申请公布号 |
WO2014190070(A1) |
申请公布日期 |
2014.11.27 |
申请号 |
WO2014US38997 |
申请日期 |
2014.05.21 |
申请人 |
ROBINSON, ALEX PHILIP GRAAHAM;PALMER, RICHARD EDWARD;FROMMHOLD, ANDREAS;YANG, DONGXU |
发明人 |
ROBINSON, ALEX PHILIP GRAAHAM;PALMER, RICHARD EDWARD;FROMMHOLD, ANDREAS;YANG, DONGXU |
分类号 |
G03F7/004;C01B31/02;C07C62/34;C07C209/70 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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