| 发明名称 |
COMPOSITION FOR RESIST LOWER LAYER FILM, METHOD FOR FORMING PATTERN USING SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE COMPRISING PATTERN |
| 摘要 |
Provided is a composition for a resist lower layer film, the composition comprising: a compound including a part represented by Formula 1; and a solvent. In the Formula 1, A1 to A3, X1, X2, L1, L2, Z, and m are as defined in the specification respectively. |
| 申请公布号 |
WO2014189185(A1) |
申请公布日期 |
2014.11.27 |
| 申请号 |
WO2013KR09957 |
申请日期 |
2013.11.05 |
| 申请人 |
CHEIL INDUSTRIES INC. |
发明人 |
KIM, MIN-GYUM;KWON, HYO-YOUNG;LEE, JUN-HO;CHEON, HWAN-SUNG |
| 分类号 |
G03F7/004;G03F7/11;G03F7/26;H01L21/027 |
主分类号 |
G03F7/004 |
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