发明名称 SAMPLE SUPPORTING MEMBER FOR OBSERVING SCANNING ELECTRON MICROSCOPIC IMAGE AND METHOD FOR OBSERVING SCANNING ELECTRON MICROSCOPIC IMAGE
摘要 When injection of electrons into a sample supporting member causes a potential gradient between an insulative thin film and a conductive thin film at a site of electron beam injection, the potential barrier of the surface of the insulative thin film becomes thin, and an electron emission phenomenon is caused by tunnel effects. Secondary electrons caused in the insulative thin film tunnel to the conductive thin film along the potential gradient. The secondary electrons, having tunneled, reach a sample while diffusing in the conductive thin film. In the case where the sample is a sample with a high electron transmittance, such as a biological sample, the secondary electrons also tunnel through the interior of the sample. The secondary electrons are detected to acquire an SEM image in which the inner structure of the sample is reflected.
申请公布号 US2014346352(A1) 申请公布日期 2014.11.27
申请号 US201214364530 申请日期 2012.12.26
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY 发明人 Ogura Toshihiko
分类号 H01J37/20;H01J37/28 主分类号 H01J37/20
代理机构 代理人
主权项 1. A sample supporting member used for observing a scanning electron microscopic image, comprising a laminate of an insulative thin film and a conductive thin film, wherein a surface on a side of the insulative thin film is an electron beam incident surface, and a surface on a side of the conductive thin film is a sample adhesion surface.
地址 Chiyoda-ku, Tokyo JP