| 发明名称 |
DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE |
| 摘要 |
The present invention provides a drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus comprising an optical system configured to irradiate the substrate with the charged particle beam, a substrate stage configured to hold the substrate, an aperture member provided with the substrate stage, a detector configured to detect a charged particle beam having passed through an aperture of the aperture member, and a support configured to support the detector, wherein the support and the substrate stage are separated from each other. |
| 申请公布号 |
US2014346349(A1) |
申请公布日期 |
2014.11.27 |
| 申请号 |
US201414279679 |
申请日期 |
2014.05.16 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
NISHIMURA Naosuke |
| 分类号 |
H01J37/20;H01J37/30;H01J37/317 |
主分类号 |
H01J37/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A drawing apparatus for performing drawing on a substrate with a charged particle beam, the apparatus comprising:
an optical system configured to irradiate the substrate with the charged particle beam; a substrate stage configured to hold the substrate; an aperture member provided with the substrate stage; a detector configured to detect a charged particle beam having passed through an aperture of the aperture member; and a support configured to support the detector, wherein the support and the substrate stage are separated from each other. |
| 地址 |
Tokyo JP |
