| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a device and a method for retaining an immersion fluid in a gap located adjacent to a projection lens when a work-piece of a lithographic machine is replaced.SOLUTION: A liquid immersion lithography device includes: an optical assembly 16 which is formed so as to project an image on a work-piece 208; and a stage assembly 202 including a work-piece table 204 which is formed so as to support the work-piece 208 located adjacent to the optical assembly 16. An environmental system 26 is provided to supply/remove an immersion fluid 212 to/from a gap between the optical assembly 16 and the work-piece 208 on the stage assembly 202. After exposure of the work-piece 208 is completed, a replacement system 216 takes out the work-piece 208 to replace the work-piece 208 with a second work-piece. An immersion fluid retention system 214 is provided to retain the immersion fluid 212 in the gap when the first work-piece is taken out to be replaced with the second work-piece.</p> |
