| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate processing method which can prevent stopping of substrate processing when abnormality occurs at a part used for either one of edge exposure or substrate inspection.SOLUTION: In a substrate processing method of performing predetermined substrate processing by using a substrate processing device which can perform an edge exposure process of irradiating light by an irradiation part of an edge exposure part to expose a peripheral part of a substrate and a substrate inspection process of imaging an image of a substrate by an imaging part of a substrate inspection part to perform inspection of the substrate based on the imaged image, in the case where the predetermined substrate processing includes the edge exposure process and the substrate inspection process and abnormality occurs in the substrate inspection part, the edge exposure process is performed and the substrate inspection process is skipped when the abnormality is not caused in the edge exposure part.</p> |
