发明名称 Testing of Thru-Silicon Vias
摘要 A system and a method are disclosed for testing thru-silicon vias (TSVs) in a silicon die. A silicon die containing multiple TSVs is mounted on a wafer tape. Two probe points are probed on the exposed side of the silicon die. A resistance is measured between the two probe points and an electrical integrity is determined based on the measured resistance.
申请公布号 US2014347089(A1) 申请公布日期 2014.11.27
申请号 US201414283116 申请日期 2014.05.20
申请人 eSilicon Corporation 发明人 DeLaCruz Javier
分类号 G01R31/02;G01R31/26 主分类号 G01R31/02
代理机构 代理人
主权项 1. A method for testing thru-silicon vias (TSVs) in a silicon die, the TSVs for providing interconnection between opposite sides of the silicon die, the method comprising: mounting the silicon die on wafer tape, the wafer tape having a resistivity that is sufficiently low to form a conductive path between TSVs; contacting two probe points on the exposed side of the silicon die, each probe point electrically connected to one of two different TSVs; measuring a resistance between the two probe points; and determining an electrical integrity of the two TSVs based on the measured resistance.
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