IMPRINTING METHOD, IMPRINTING APPARATUS, AND DEVICE MANUFACTURING METHOD

摘要

An imprinting method of this disclosure includes supplying an imprint material on a substrate having a pattern including a mark on the substrate formed thereon; bringing a mold having a pattern including a mark on the mold into contact with the imprint material; curing the imprint material in a state in which the mold is in contact therewith; and forming a pattern including the mark on the imprint material, and characterized in that an optical system configured to form an image of the mark on the imprint material and an image of the mark on the substrate are used to detect the mark on the imprint material and the mark on the substrate after the space between the substrate and the mold has been increased until the mark on the mold is positioned out of a focal depth of the optical system, thereby obtaining a relative positional deviation between the pattern on the substrate and the pattern on the imprint material.

主权项

1. An imprinting method comprising:
supplying an imprint material on a substrate having a shot area including a pattern having a mark on the substrate formed thereon; bringing a mold having a pattern including a mark of the mold into contact with the imprint material; curing the imprint material in a state in which the mold is in contact therewith; and forming a pattern including the mark on the imprint material formed by the mark on the mold transferred thereto by increasing a space between the substrate and the mold, wherein a sensor and an optical system configured to forming an image of the mark on the imprint material and an image of the mark on the substrate by light passing through the mold on the sensor are used to detect the mark on the imprint material and the mark on the substrate by the sensor after the space between the imprint material and the mold has been increased until the mark on the mold is positioned out of a focal depth of the optical system, thereby obtaining a relative positional deviation between the pattern on the substrate and the pattern on the imprint material.