发明名称 SEMICONDUCTOR STRUCTURE WITH SACRIFICIAL ANODE AND METHOD FOR FORMING
摘要 A packaged semiconductor device is made by forming a conductive pad on an external surface of an integrated circuit device, forming a passivation layer over the conductive pad, removing a portion of the passivation layer over a bond area on the conductive pad, forming a sacrificial anode around a majority of a periphery surrounding the bond area, forming a conductive bond in the bond area, and forming an encapsulating material around the conductive bond and an exposed portion of the sacrificial anode.
申请公布号 US2014346663(A1) 申请公布日期 2014.11.27
申请号 US201313898949 申请日期 2013.05.21
申请人 Chopin Sheila F.;Ding Min;Mathew Varughese;Roth Scott S. 发明人 Chopin Sheila F.;Ding Min;Mathew Varughese;Roth Scott S.
分类号 H01L23/00 主分类号 H01L23/00
代理机构 代理人
主权项 1. A method for fabricating a semiconductor structure comprising: forming a conductive layer on a integrated circuit (IC) wafer; forming a first sacrificial layer over a major surface of the conductive layer; forming a passivation layer over the first sacrificial layer; removing a portion of the passivation layer and a portion of the first sacrificial layer from a bond area on the major surface of the conductive layer; and forming an encapsulating material over the passivation layer and in contact with an exposed portion of the sacrificial layer.
地址 Austin TX US