发明名称 |
AEROSOL DEPOSITION COATING FOR SEMICONDUCTOR CHAMBER COMPONENTS |
摘要 |
A method for coating a component for use in a semiconductor chamber for plasma etching includes providing the component and loading the component in a deposition chamber. A pressure in the deposition chamber is reduced to below atmospheric pressure. A coating is deposited on the component by spraying an aerosol comprising a suspension of a first type of metal oxide nanoparticle and a second type of metal oxide nanoparticle onto the component at approximately room temperature. |
申请公布号 |
WO2014190211(A1) |
申请公布日期 |
2014.11.27 |
申请号 |
WO2014US39244 |
申请日期 |
2014.05.22 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SUN, JENNIFER Y.;KANUNGO, BIRAJA P.;CHO, TOM;ZHANG, YING |
分类号 |
H01L21/208;H01L21/02 |
主分类号 |
H01L21/208 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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