发明名称 POSITION DETECTION APPARATUS, IMPRINT APPARATUS, AND POSITION DETECTION METHOD
摘要 A position detection apparatus includes an illumination optical system for illuminating a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence, and a detection optical system for detecting diffracted light from the first diffraction grating and the second diffraction grating, wherein a relative position of the first diffraction grating and the second diffraction grating is detected based on the detected diffracted light, and wherein the illumination optical system includes a plurality of light intensity distributions in the first direction except for on an optical axis of the detection optical system, in a pupil plane thereof.
申请公布号 US2014346694(A1) 申请公布日期 2014.11.27
申请号 US201414458063 申请日期 2014.08.12
申请人 CANON KABUSHIKI KAISHA 发明人 Minoda Ken;Shiode Yoshihiro;Mishima Kazuhiko;Maeda Hironori
分类号 B29D11/00;G02B5/18 主分类号 B29D11/00
代理机构 代理人
主权项 1. An imprint apparatus for transferring a pattern formed on a mold to an imprint material supplied to a substrate, the apparatus comprising a detection apparatus configured to detect light diffracted by diffraction gratings formed on the mold and the substrate, wherein the detection apparatus comprises an illumination optical system configured to illuminate a first diffraction grating having periods in each of a first direction and a second direction different from the first direction, and a second diffraction grating having a period different from the period in the second direction of the first diffraction grating in the second direction, at an oblique incidence; and a detection optical system configured to detect diffracted light from the first diffraction grating and the second diffraction grating, wherein the illumination optical system includes a first pole and a second pole which is in opposite side of the first pole with respect to an optical axis on a pupil plane thereof, and wherein the detection optical system detects the light diffracted by the first diffraction grating and the second diffraction grating by illuminating the first diffraction grating and the second diffraction grating with the light from the first pole and the second pole at an oblique incidence in the first direction radiated from the illumination optical system.
地址 Tokyo JP