发明名称 ARRAY SUBSTRATE, MANUFACTURING METHOD THEREFOR AND DISPLAY DEVICE THEREOF
摘要 <p>An array substrate, a manufacturing method therefor and a display device thereof. The method includes: forming a gate metal layer on a substrate (31), forming patterns including gates (32) and gate lines by patterning processes; successively forming an insulating layer (38), a semiconductor material layer and a source/drain metal layer on the substrate (31) with patterns of gates (32) and gate lines formed thereon, forming patterns including a semiconductor layer (33a), source/drain electrodes (34) and data lines (35) by the patterning processes, wherein the patterns of the source/drain electrodes (34) are consistent with the patterns of the semiconductor layer (33a); forming a first transparent conductive layer on the substrate (31) with the semiconductor layer (33a), the source/drain electrodes (34) and the data lines (35) formed thereon, forming the patterns of the first transparent electrodes (36) by the patterning processes, and forming gaps (39) on the patterns of the source/drain electrodes (34) to form the patterns of sources (341) and drains (342).</p>
申请公布号 WO2014187080(A1) 申请公布日期 2014.11.27
申请号 WO2013CN86759 申请日期 2013.11.08
申请人 BOE TECHNOLOGY GROUP CO., LTD. 发明人 CHOI, SEUNGJIN;KIM, HEECHEOL;SONG, YOUNGSUK;YOO, SEONGYEOL
分类号 H01L21/77;G02F1/1362;H01L21/28;H01L29/786 主分类号 H01L21/77
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