| 发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD |
| 摘要 |
A lithographic projection apparatus is disclosed for use with an immersion liquid positioned between the projection system and a substrate, Several methods and mechanism are disclosed to protect components of the projection system, substrate table and a liquid confinement system. These include providing a protective coating on a final element of the projection system as well as providing one or more sacrificial bodies upstream of the components. A two component final optical element of CaF2 is also disclosed. |
| 申请公布号 |
US2014347642(A1) |
申请公布日期 |
2014.11.27 |
| 申请号 |
US201414456845 |
申请日期 |
2014.08.11 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
LOOPSTRA Erik Roelof;Matheus Baselmans Johannes Jacobus;Theodore Marie Dierichs Marcel Mathijs;Maria Jasper Johannes Christiaan;Lipson Matthew;Meijer Hendricus Johannes Maria;Mickan Uwe;Mulkens Johannes Catharinus Hubertus;Uitterdijk Tammo |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithographic projection apparatus, comprising:
a projection system configured to project a pattern from a patterning device onto a substrate; and a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, wherein an element of the projection system through which the pattern is projected has, on a surface configured to be in contact with the liquid, a protective coating which is substantially insoluble in the liquid. |
| 地址 |
Veldhoven NL |
