SUBSTRATE PROCESSING APPARATUS

摘要

The invention relates to a substrate processing apparatus (10) comprising a support frame (60), a radiation projection system (20) for projecting radiation onto a substrate to be processed, a substrate support structure (30) for supporting the substrate, and a fluid transfer system (150). The radiation projection system comprises a cooling arrangement (130) and is supported by and vibrationally decoupled from the support frame such that vibrations of the support frame above a predetermined maximum frequency are substantially decoupled from the radiation projection system. The fluid transfer system comprises at least one tube (140) fixed at two points (151,152), and comprises a flexible portion. A substantial part of the flexible portion extends over a plane substantially parallel to the substrate support structure surface. The stiffness of the flexible portion is adapted to substantially decouple vibrations at the second fixed point which are above the predetermined maximum frequency from the first fixed point.

主权项

1. Substrate processing apparatus, such as a lithographic apparatus or an inspection apparatus, comprising:
a support frame; a radiation projection system for projecting radiation onto a substrate to be processed, the radiation projection system comprising a cooling arrangement and being supported by and vibrationally decoupled from the support frame such that vibrations of the support frame above a predetermined maximum frequency are substantially decoupled from the radiation projection system; and a substrate support structure provided with a surface for supporting the substrate to be processed;the substrate processing apparatus further comprising a fluid transfer system for providing fluid to and removing fluid from the cooling arrangement of the radiation projection system, wherein the fluid transfer system comprises at least one tube fixed at at least two points within the apparatus, the fluid transfer system comprising a flexible portion extending between the two fixed points and including the at least one tube, a first one of the fixed points being fixed relative to the radiation projection system and a second one of the fixed points being moveable relative to the radiation projection system,
wherein at least a substantial part of the flexible portion extends in two dimensions over a plane substantially parallel to the surface of the substrate support structure, and wherein the stiffness of the flexible portion between the two points is adapted to substantially decouple vibrations at the second fixed point which are above the predetermined maximum frequency from the first fixed point, and wherein the at least one tube is oriented in a curved fashion in the plane substantially parallel to the surface of the substrate support structure so as to attenuate vibrations in the plane and between the two fixed points.