发明名称 SCHOTTKY DIODE AND METHOD FOR FABRICATING THE SAME
摘要 A Schottky diode includes a deep well formed in a substrate, an isolation layer formed in the substrate, a first conductive type guard ring formed in the deep well along an outer sidewall of the isolation layer and located at a left side of the isolation layer, a second conductive type well formed in the deep well along the outer sidewall of the isolation layer and located at a right side of the isolation layer, an anode electrode formed over the substrate and coupled to the deep well and the guard ring, and a cathode electrode formed over the substrate and coupled to the well. A part of the guard ring overlaps the isolation layer.
申请公布号 US2014349470(A1) 申请公布日期 2014.11.27
申请号 US201414454666 申请日期 2014.08.07
申请人 Son Jin-Yeong 发明人 Son Jin-Yeong
分类号 H01L29/66;H01L21/265 主分类号 H01L29/66
代理机构 代理人
主权项 1. A method for fabricating a Schottky diode, comprising: forming an isolation layer in a substrate in which a second conductive type deep well is formed; forming a second conductive type well in the deep well along an outer sidewall of the isolation layer to be located at one side of the isolation layer; forming a first conductive type guard ring in the deep well along the outer sidewall of the isolation layer to be located at an opposite side of the isolation layer in such a manner that a part of the guard ring overlaps the isolation layer; and forming an anode electrode over the substrate to be coupled to the deep well and the guard ring and simultaneously forming a cathode electrode coupled to the well over the substrate.
地址 Chungcheongbuk-do KR