发明名称 SOLAR CELL WITH METAL GRID FABRICATED BY ELECTROPLATING
摘要 One embodiment of the present invention provides a solar cell. The solar cell includes a photovoltaic structure, a transparent-conductive-oxide (TCO) layer situated above the photovoltaic structure, and a front-side metal grid situated above the TCO layer. The TCO layer is in contact with the front surface of the photovoltaic structure. The metal grid includes at least one of: Cu and Ni.
申请公布号 US2014349441(A1) 申请公布日期 2014.11.27
申请号 US201414454604 申请日期 2014.08.07
申请人 Silevo, Inc. 发明人 Fu Jianming;Xu Zheng;Yu Chentao;Heng Jiunn Benjamin
分类号 H01L31/18;H01L31/20 主分类号 H01L31/18
代理机构 代理人
主权项 1. A method for fabricating a solar cell, comprising: forming a photovoltaic structure; forming a layer of transparent-conductive-oxide (TCO) situated above the photovoltaic structure; forming a front-side electrode grid situated above the TCO layer by: depositing, using a physical vapor deposition (PVD) technique, one or more metal layers; anddepositing, using an electroplating technique, a copper layer situated above the one or more PVD-deposited metal layers; and forming a back-side electrode.
地址 Fremont CA US