发明名称 |
SOLAR CELL WITH METAL GRID FABRICATED BY ELECTROPLATING |
摘要 |
One embodiment of the present invention provides a solar cell. The solar cell includes a photovoltaic structure, a transparent-conductive-oxide (TCO) layer situated above the photovoltaic structure, and a front-side metal grid situated above the TCO layer. The TCO layer is in contact with the front surface of the photovoltaic structure. The metal grid includes at least one of: Cu and Ni. |
申请公布号 |
US2014349441(A1) |
申请公布日期 |
2014.11.27 |
申请号 |
US201414454604 |
申请日期 |
2014.08.07 |
申请人 |
Silevo, Inc. |
发明人 |
Fu Jianming;Xu Zheng;Yu Chentao;Heng Jiunn Benjamin |
分类号 |
H01L31/18;H01L31/20 |
主分类号 |
H01L31/18 |
代理机构 |
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代理人 |
|
主权项 |
1. A method for fabricating a solar cell, comprising:
forming a photovoltaic structure; forming a layer of transparent-conductive-oxide (TCO) situated above the photovoltaic structure; forming a front-side electrode grid situated above the TCO layer by:
depositing, using a physical vapor deposition (PVD) technique, one or more metal layers; anddepositing, using an electroplating technique, a copper layer situated above the one or more PVD-deposited metal layers; and forming a back-side electrode. |
地址 |
Fremont CA US |