| 摘要 |
<p>[Problem] To prevent the disturbance of fine dust due to the movement of a moving stage by being lifted by gas, the moving stage being used within a processing chamber in which the atmosphere is regulated. [Solution] A moving stage (3) disposed within a processing chamber (2) for processing an object to be processed (semiconductor substrate (100)) in a regulated atmosphere, the moving stage being provided with a stage main body (30) on which the object to be processed is placed, and a gas supporting unit for supporting the stage main body (30) in a non-contact manner by means of gas pressure, wherein the gas supporting unit has one or multiple gas pads (35) which is disposed along the horizontal surface and/or the vertical surface of the processing chamber (2) and which blows gas on the aforementioned surfaces, a fine dust suction port (42) is disposed on the periphery of the gas pad (35), and a suction gas exhaust line (suction gas exhaust tube (43)) which is in communication with the fine dust suction port (42) and which extends towards the outside of the processing chamber is disposed.</p> |
