EXPOSURE DEVICE AND EXPOSURE METHOD

摘要

PROBLEM TO BE SOLVED: To provide an exposure device which performs exposure processing of a repetitive pattern on a whole area without changing the number of shots even when the substrate size changes to achieve good productivity by a certain exposure processing time regardless of the substrate size.SOLUTION: An exposure device comprises: a micro lens array 4 in which micro lenses 4A each arranged in each shot number preset region As are two-dimensionally arranged at a preset arrangement pitch for exposing one one-shot exposure region Bp in the shot number preset region; a mask for projection exposing the repetitive pattern on the one-shot exposure region Bp; a light source for irradiating light; and exposure position shift means for sequentially shifting an exposure position with respect to each one-shot exposure region Bp. The exposure position shift means repeats an operation after exposing one one-shot exposure region Bp in the shot number preset region As to expose adjacent one-shot exposure region Bp in the shot number preset region As to exposure a whole area of the shot number preset region As.