发明名称 PELLICLE AND EUV EXPOSURE DEVICE COMPRISING SAME
摘要 The present invention addresses the problem of providing a pellicle which has high EUV transmittance and high strength, while being not susceptible to damage by heat. In order to solve the above-mentioned problem, the present invention provides a pellicle which comprises a pellicle film that has a refractive index (n) of light having a wavelength of 550 nm of 1.9-5.0 and a pellicle frame to which the pellicle film is bonded. The pellicle film has a composition that contains 30-100% by mole of carbon and 0-30% by mole of hydrogen. The intensity ratio of the 2D-band to the G-band, namely (intensity in 2D-band)/(intensity in G-band) is 1 or less, or alternatively, the intensity in the 2D-band and the intensity in the G-band are 0 in the Raman spectrum of the pellicle film.
申请公布号 WO2014188710(A1) 申请公布日期 2014.11.27
申请号 WO2014JP02642 申请日期 2014.05.20
申请人 MITSUI CHEMICALS, INC. 发明人 ONO, YOSUKE;KOHMURA, KAZUO
分类号 H01L21/027;G03F1/24;G03F1/62 主分类号 H01L21/027
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