发明名称 METHOD FOR PRODUCING THE P-N JUNCTION OF A THIN-FILM PHOTOVOLTAIC CELL AND CORRESPONDING METHOD FOR PRODUCING A PHOTOVOLTAIC CELL
摘要 The invention relates to a method for producing a p-n junction in a thin-film photovoltaic cell, comprising a deposition step wherein the following are successively produced: a layer of precursors (12, 13) of a photovoltaic material of type p or n, a barrier layer (14), and a layer (15) of precursors of a semi-conductor material of type n or p, said deposition step being followed by an annealing step carried out with a supply of S and/or Se. Said annealing step leads to the formation of an absorbent layer (22) of type p or n and a buffer layer (25) of type n or p and a p-n junction at the interface between said layers, the barrier layer (14) preventing chemical diffusion and oxidation at said interface during said annealing step.
申请公布号 WO2014188386(A1) 申请公布日期 2014.11.27
申请号 WO2014IB61659 申请日期 2014.05.23
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES 发明人 ALTAMURA, GIOVANNI;GRENET, LOUIS;PERRAUD, SIMON;ROUX, FRÉDÉRIC
分类号 H01L31/072;H01L31/0749;H01L31/18 主分类号 H01L31/072
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