发明名称 |
METHOD FOR PRODUCING THE P-N JUNCTION OF A THIN-FILM PHOTOVOLTAIC CELL AND CORRESPONDING METHOD FOR PRODUCING A PHOTOVOLTAIC CELL |
摘要 |
The invention relates to a method for producing a p-n junction in a thin-film photovoltaic cell, comprising a deposition step wherein the following are successively produced: a layer of precursors (12, 13) of a photovoltaic material of type p or n, a barrier layer (14), and a layer (15) of precursors of a semi-conductor material of type n or p, said deposition step being followed by an annealing step carried out with a supply of S and/or Se. Said annealing step leads to the formation of an absorbent layer (22) of type p or n and a buffer layer (25) of type n or p and a p-n junction at the interface between said layers, the barrier layer (14) preventing chemical diffusion and oxidation at said interface during said annealing step. |
申请公布号 |
WO2014188386(A1) |
申请公布日期 |
2014.11.27 |
申请号 |
WO2014IB61659 |
申请日期 |
2014.05.23 |
申请人 |
COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIESALTERNATIVES |
发明人 |
ALTAMURA, GIOVANNI;GRENET, LOUIS;PERRAUD, SIMON;ROUX, FRÉDÉRIC |
分类号 |
H01L31/072;H01L31/0749;H01L31/18 |
主分类号 |
H01L31/072 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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