发明名称 APPARATUS FOR ATTACHING AND DETACHING SUBSTRATE
摘要 <p>Disclosed are a rotary shaft module and a deposition apparatus. An apparatus attaches and detaches a substrate to and from a mask in a chamber. The apparatus includes: an outer shaft that penetrates the chamber to be installed; a mask frame holder which is joined to an end portion of the outer shaft and supports a mask frame to which the mask is attached; an inner shaft that has one end penetrating the outer shaft in a lengthwise direction, and moves up in the lengthwise direction of the outer shaft; a back plate which is arranged on the upper portion of the mask frame and is horizontally joined with an end portion of the inner shaft so as to face the mask; a substrate holder which supports the substrate to make the substrate be interposed between the back plate and the mask frame, and is joined with the back plate; and an inner shaft lifting part which lifts up the inner shaft. The apparatus has a simplified structure for attaching and detaching the substrate to and from the mask; thus, the inside of the vacuum chamber, which is narrow, can be efficiently utilized.</p>
申请公布号 KR20140135414(A) 申请公布日期 2014.11.26
申请号 KR20130055618 申请日期 2013.05.16
申请人 SUNIC SYSTEM. LTD. 发明人 HWANG, IN HO
分类号 H01L51/56;C23C14/24 主分类号 H01L51/56
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