| 摘要 |
<p>The invention provides a light-shielding film for a solid-state imaging device, the solid-state imaging device comprising, on at least one surface of a silicon substrate, an imaging device unit comprising a light-receiving element, and a wall formed on the at least one surface of the silicon substrate on which the imaging device unit is formed, the light-shielding film being formed by spraying, on the at least one surface of the silicon substrate on which the light-receiving element is formed and on the wall formed on the at least one surface of the silicon substrate on which the light-receiving element is formed, a radiation-sensitive composition comprising: (A) a pigment dispersion comprising a dispersed material comprising a black pigment, a dispersant, and an organic solvent, 90% of the dispersed material having a particle diameter of from 15 nm to 30 nm; (B) a polymerizable compound; and (C) a polymerization initiator.</p> |
