| 摘要 |
<p>Particulate shields above the top wafer in wafer containers such as FOUPS prevent accumulation of particulates on wafers. The shields may be formed of materials that are compatible to maintaining less than 5% RH, particularly materials that will not absorb meaningful amounts of water, and that will not bring absorbed moisture into the container, for example cyclic olefin polymers, cyclic olefin copolymers, liquid crystal polymers. A FOUP may be provided with an additional slot above industry standard 25 slots to receive a dedicated barrier. In embodiments, the barrier may be a shape corresponding to a wafer. The barrier may have inherent charge properties opposite to the particulates in the containers to attract the particulates. The barrier may have apertures to facilitate charge development. The barrier may be retrofitted to existing wafer containers. The shield may conform to FOUP configuration.</p> |
