| 摘要 |
This profile-measuring device causes a contact to follow a surface of an object-to-be-measured and measures a profile of the surface. A pseudo-measurement point acquiring section acquires, as pseudo-measurement points, positional coordinates of a basing point of the contact when said contact contacts with said object-to-be-measured at plural places. In addition, a contact-model allocating section allocates a contact model by matching the basing point to the pseudo-measurement point, and matching an orientation of the contact and the contact model at a time of measuring, the contact model specifying a surface profile of the contact and having a predetermined definition range. A measurement-point acquiring section acquires, as measurement points, positions of the surface of the object-to-be-measured based on the contact model and the pseudo-measurement points. A measurement-point deleting section deletes a measurement point obtained by the measurement-point acquiring section based on a relationship between the definition range and the measurement points. |
