发明名称 METHOD FOR GROWING SILICON SINGLE CRYSTAL
摘要 <p>The present invention provides a method for growing a carbon-doped silicon single crystal that grows a silicon single crystal from a raw material melt in a crucible having carbon added therein by the Czochralski method, wherein an extruded material or a molded material is used as a dopant for adding the carbon to a raw material in the crucible. As a result, there can be provided the method for growing a carbon-doped silicon single crystal, by which the carbon can be easily doped in the silicon single crystal at low cost and a carbon concentration in the silicon single crystal can be accurately controlled in a silicon single crystal pulling up process by the Czochralski method.</p>
申请公布号 KR101465425(B1) 申请公布日期 2014.11.26
申请号 KR20097024707 申请日期 2008.04.18
申请人 发明人
分类号 C30B15/04;C30B29/06;H01L21/02 主分类号 C30B15/04
代理机构 代理人
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