发明名称 Method of making a semiconductor device comprising a land grid array flip chip bump system with short bumps
摘要 A semiconductor device has a semiconductor wafer with a plurality of semiconductor die including a plurality of contact pads. An insulating layer is formed over the semiconductor wafer and contact pads. An under bump metallization (UBM) is formed over and electrically connected to the plurality of contact pads. A mask is disposed over the semiconductor wafer with a plurality of openings aligned over the plurality of contact pads. A conductive bump material is deposited within the plurality of openings in the mask and onto the UBM. The mask is removed. The conductive bump material is reflowed to form a plurality of bumps with a height less than a width. The plurality of semiconductor die is singulated. A singulated semiconductor die is mounted to a substrate with bumps oriented toward the substrate. Encapsulant is deposited over the substrate and around the singulated semiconductor die.
申请公布号 US8895430(B2) 申请公布日期 2014.11.25
申请号 US201213434660 申请日期 2012.03.29
申请人 Great Wall Semiconductor Corporation 发明人 Anderson Samuel J.;Dashney Gary;Okada David N.
分类号 H01L21/44;H01L23/00;H01L23/31 主分类号 H01L21/44
代理机构 Patent Law Group: Atkins and Associates, P.C. 代理人 Atkins Robert D.;Patent Law Group: Atkins and Associates, P.C.
主权项 1. A method of making a semiconductor device, comprising: providing a semiconductor wafer including a plurality of semiconductor die comprising a plurality of contact pads; forming an insulating layer over the semiconductor wafer and the plurality of contact pads; forming a plurality of openings in the insulating layer over the contact pads; forming a first conductive layer over and electrically connected to the plurality of contact pads; forming a second conductive layer over and electrically connected to the first conductive layer; providing a mask including a plurality of mask openings with a width less than a width of the openings in the insulating layer; disposing the mask over the semiconductor wafer with the mask openings aligned over the plurality of contact pads; depositing a conductive bump material within the plurality of mask openings and on the second conductive layer; removing the mask; reflowing the conductive bump material to form a plurality of bumps with a height of a first bump of the plurality of bumps less than a width of the first bump; and singulating the plurality of semiconductor die.
地址 Tempe AZ US