发明名称 Cobalt titanium oxide dielectric films
摘要 Electronic apparatus and methods of forming the electronic apparatus include cobalt titanium oxide on a substrate for use in a variety of electronic systems. The cobalt titanium oxide may be structured as one or more monolayers. The cobalt titanium oxide may be formed by a monolayer by monolayer sequencing process such as atomic layer deposition.
申请公布号 US8895442(B2) 申请公布日期 2014.11.25
申请号 US201313908479 申请日期 2013.06.03
申请人 Micron Technology, Inc. 发明人 Ahn Kie Y.;Forbes Leonard
分类号 H01L23/02;H01L21/28;C23C16/455;H01L49/02;H01L29/06;H01L21/316;H01L29/51;H01L29/94;H01L29/788;H01L29/78;H01L21/314;C23C16/40 主分类号 H01L23/02
代理机构 Schwegman Lundberg & Woessner, P.A. 代理人 Schwegman Lundberg & Woessner, P.A.
主权项 1. A method comprising: forming cobalt titanium oxide by a monolayer or partial monolayer sequencing process including: pulsing a cobalt-containing precursor;pulsing a titanium-containing precursor; andperforming a removal process between pulsing the cobalt-containing precursor and pulsing the titanium-containing precursor such that a gas containing cobalt is not present when pulsing the titanium-containing precursor and a gas containing titanium is not present when pulsing the cobalt-containing precursor.
地址 Boise ID US