发明名称 |
Cobalt titanium oxide dielectric films |
摘要 |
Electronic apparatus and methods of forming the electronic apparatus include cobalt titanium oxide on a substrate for use in a variety of electronic systems. The cobalt titanium oxide may be structured as one or more monolayers. The cobalt titanium oxide may be formed by a monolayer by monolayer sequencing process such as atomic layer deposition. |
申请公布号 |
US8895442(B2) |
申请公布日期 |
2014.11.25 |
申请号 |
US201313908479 |
申请日期 |
2013.06.03 |
申请人 |
Micron Technology, Inc. |
发明人 |
Ahn Kie Y.;Forbes Leonard |
分类号 |
H01L23/02;H01L21/28;C23C16/455;H01L49/02;H01L29/06;H01L21/316;H01L29/51;H01L29/94;H01L29/788;H01L29/78;H01L21/314;C23C16/40 |
主分类号 |
H01L23/02 |
代理机构 |
Schwegman Lundberg & Woessner, P.A. |
代理人 |
Schwegman Lundberg & Woessner, P.A. |
主权项 |
1. A method comprising:
forming cobalt titanium oxide by a monolayer or partial monolayer sequencing process including:
pulsing a cobalt-containing precursor;pulsing a titanium-containing precursor; andperforming a removal process between pulsing the cobalt-containing precursor and pulsing the titanium-containing precursor such that a gas containing cobalt is not present when pulsing the titanium-containing precursor and a gas containing titanium is not present when pulsing the cobalt-containing precursor. |
地址 |
Boise ID US |