发明名称 Method of forming organic semiconductor device that includes forming electrode contact layer by treating electrode surfaces with substance containing substituted arene
摘要 Method for producing a semiconductor device such as an organic thin film transistor, and a device produced by the method, the method including the steps of forming conducting electrodes over a substrate, treating a surface of the electrodes with an arene substituted with an electron-withdrawing group to form an electrode contact layer over the electrodes, and forming an organic semiconductor layer over the substrate and electrodes, in which the substrate and electrodes are baked before the organic semiconductor layer is formed so as to reduce contaminants on the electrode contact layer and thereby promote improved crystal nucleation on a surface of the electrode.
申请公布号 US8895354(B2) 申请公布日期 2014.11.25
申请号 US201113807190 申请日期 2011.06.30
申请人 Cambridge Display Technology Limited 发明人 Kugler Thomas;Newsome Christopher;Othman Mohd K.
分类号 H01L51/40;H01L51/05;H01L51/10;H01L51/00 主分类号 H01L51/40
代理机构 Marshal, Gerstein & Borun LLP 代理人 Marshal, Gerstein & Borun LLP
主权项 1. A method of producing a semiconductor device, the method comprising: forming conducting electrodes over a substrate wherein the electrodes comprise metal; treating a surface of the electrodes with a treatment substance comprising an arene substituted with an electron-withdrawing group and a thiol group, the thiol group binding to the surface of the electrodes, thereby forming an electrode contact layer over the electrodes; and forming an organic semiconductor layer over the substrate and electrodes; wherein the substrate and electrodes are baked before the organic semiconductor layer is formed, so as to dehydrate the surface of the electrode contact layer and thereby promote crystal nucleation of the organic semiconductor on a surface of the electrode; wherein the bake is performed at a temperature greater than or equal to 60° C. and less than or equal to 140° C.
地址 Cambridgeshire GB