Exposure apparatus, exposure method, method for manufacturing device

摘要

An exposure method and apparatus exposes a substrate via a projection optical system and a liquid. The liquid is circulated in a circulation path. At least a part of the liquid in the circulation path is supplied through a discharge path to a space below the projection optical system, the discharge path being connected to the circulation path. The substrate is exposed via the projection optical system and the liquid.

主权项

1. An exposure method which exposes a substrate via a projection optical system and a liquid, the method comprising:
circulating the liquid in a circulation path; supplying at least a part of the liquid in the circulation path through a discharge path to a space below the projection optical system, the discharge path being not a part of the circulation path and being connected to the circulation path, an immersion area being formed on the substrate by supplying the liquid through the discharge path, the space including the immersion area, the immersion area being smaller than an area of an upper surface of the substrate; and exposing the substrate via the projection optical system and the immersion area of the liquid.