Interspinous process implants and methods of use

摘要

Systems and method in accordance with an embodiment of the present invention can includes an implant comprising a first wing, a spacer extending from the first wing, and a distraction guide. The distraction guide is arranged in a first configuration to pierce and/or distract tissue associated with adjacent spinous processes extending from vertebrae of a targeted motion segment. The implant can be positioned between the adjacent spinous processes and once positioned, the implant can be arranged in a second configuration. When arranged in a second configuration, the distraction guide can act as a second wing. The first wing and the second wing can limit or block movement of the implant along a longitudinal axis of the implant.

主权项

1. An apparatus, comprising:
a first implant member having a central portion, a proximal end and a distal end, wherein the central portion is configured to be disposed between a first spinous process and a second spinous process, the proximal end comprising a proximal end portion extending outwardly from the central portion, the central portion comprising a spiral portion that extends outwardly from a periphery of the central portion and is spaced apart from the proximal end portion; and a second implant member having a first portion and a second portion having inner surfaces that abut an outer surface of the first implant member and conform with a shape of the first implant member, the second portion having a maximum length that is greater than that of the first portion, the second implant member being coupled to the first implant member after the central portion is disposed between the first spinous process and the second spinous process, the first portion being configured to be disposed between the central portion and the first spinous process, the second portion being configured to be disposed between the central portion and the second spinous process, the second implant member being received over the first implant member in a direction substantially parallel to a longitudinal axis of the first implant member so as to be coupled to the first implant member after at least a portion of the first implant member is disposed between a pair of adjacent spinous processes; wherein when the second implant member is coupled to the first implant member, the first and second portions each extend through slots in the proximal end portion and end surfaces of the first and second portions each engage an outer surface of the spiraled portion.