发明名称 Copper indium gallium selenide (CIGS) thin films with composition controlled by co-sputtering
摘要 A method and apparatus for forming a thin film of a copper indium gallium selenide (CIGS)-type material are disclosed. The method includes providing first and second targets in a common sputtering chamber. The first target includes a source of CIGS material, such as an approximately stoichiometric polycrystalline CIGS material, and the second target includes a chalcogen, such as selenium, sulfur, tellurium, or a combination of these elements. The second target provides an excess of chalcogen in the chamber. This can compensate, at least in part, for the loss of chalcogen from the CIGS-source in the first target, resulting in a thin film with a controlled stoichiometry which provides effective light absorption when used in a solar cell.
申请公布号 US8894826(B2) 申请公布日期 2014.11.25
申请号 US201012884524 申请日期 2010.09.17
申请人 发明人 Frantz Jesse A.;Sanghera Jasbinder S.;Bekele Robel Y.;Nguyen Vinh Q;Aggarwal Ishwar D.;Bruce Allan J.;Cyrus Michael;Frolov Sergey V.
分类号 C23C14/00;C23C14/32;C25B9/00;C25B11/00;C25B13/00;B05D5/06;B05D5/12;H01L21/00;C23C14/06;H01L31/18;H01L31/0368;H01L31/0392;H01L21/02;C23C14/34 主分类号 C23C14/00
代理机构 US Naval Research Laboratory 代理人 US Naval Research Laboratory ;Forman Rebecca L.
主权项 1. A method for forming a film comprising: providing first and second targets in a common sputtering chamber, the first target comprising a Cu—In—Ga—Se alloy and the second target comprising a chalcogen; co-sputtering the first and second targets towards a substrate to form a film comprising polycrystalline CIGS material on the substrate which incorporates chalcogen from the second target.
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