| 摘要 |
<p>PURPOSE: An apparatus for processing a substrate are provided to prevent the leak of an RF noise to the outside of an adaptor by forming a plurality of radiation heat window of 1-5mm diameter. CONSTITUTION: In a device, a chamber is combined with a bell-jar in order to form a reaction space. The substrate mount installs a substrate in the reaction space. Housing is installed outside the bell-jar. The plasma generator is installed on the housing, and it supplies the plasma to the reaction space through a plasma pipe(134). An adapter is installed between the housing and the bell-jar. The adapter includes a heat radiation unit and a buffering unit. The adapter is formed as a cylindrical body(144) accepting the plasma pipe. The heat radiation unit is formed with a plurality of windows(146) passing through the wall of the cylindrical body. The buffering unit is formed with a bellows(148).</p> |
