发明名称 |
Indium-less transparent metalized layers |
摘要 |
Thin indium-less “optically porous” layers adapted to replace traditional ITO layers are provided herein. A thin metalized film adapted to carry an electrical charge can include a dense pattern of small openings to allow the transmission of light to or from an underlying semiconductor material. The pattern of openings can create a regular or irregular grid pattern of low aspect ratio fine-line metal conductors. Creation of this optically porous metalized film can include the printing of a catalytic precursor material, such as palladium in solution in a pattern on a substrate, drying or curing the catalytic precursor, and the deposition of a thin layer of metal, such as copper on the dried precursor to form the final conductive and optically porous film. |
申请公布号 |
US8895874(B1) |
申请公布日期 |
2014.11.25 |
申请号 |
US201012721557 |
申请日期 |
2010.03.10 |
申请人 |
Averatek Corp. |
发明人 |
Sharma Sunity Kumar;Beavers, Jr. Alex Newsom;Furst Thomas |
分类号 |
H01L23/552;C23C14/48 |
主分类号 |
H01L23/552 |
代理机构 |
McDonnell Boehnen Hulbert & Berghoff LLP |
代理人 |
McDonnell Boehnen Hulbert & Berghoff LLP |
主权项 |
1. An optoelectronic device, comprising:
a substrate having a surface; and an optically-porous electrically-conductive layer on the surface of the substrate, wherein the optically-porous electrically-conductive layer has a pattern that defines a plurality of fine openings therethrough such that the optically-porous electrically-conductive layer has an optical transmissivity of at least 85%, the optically-porous electrically-conductive layer comprising elemental palladium monoatomically bound to the surface of the substrate and an electrically conductive layer disposed on the monoatomically-bound elemental palladium. |
地址 |
Santa Clara CA US |