发明名称 |
Process for production of polycrystalline silicon |
摘要 |
The invention provides a process for producing polycrystalline silicon, including introduction of a reaction gas containing a silicon-containing component and hydrogen by means of one or more nozzles into a reactor including at least one heated filament rod on which silicon is deposited, wherein an Archimedes number Arn which describes flow conditions in the reactor, as a function of the fill level FL which states the ratio of one rod volume to one empty reactor volume in percent, for a fill level FL of up to 5% is within the range limited at the lower end by the function Ar=2000×FL−0.6 and at the upper end by the function Ar=17 000×FL−0.9, and at a fill level of greater than 5% is within a range from at least 750 to at most 4000. |
申请公布号 |
US8894766(B2) |
申请公布日期 |
2014.11.25 |
申请号 |
US201113214321 |
申请日期 |
2011.08.22 |
申请人 |
Wacker Chemie AG |
发明人 |
Schaefer Marcus;Kraetzschmar Oliver |
分类号 |
C30B21/02;C01B33/035 |
主分类号 |
C30B21/02 |
代理机构 |
Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd. |
代理人 |
Caesar, Rivise, Bernstein, Cohen & Pokotilow, Ltd. |
主权项 |
1. A process for producing polycrystalline silicon, comprising introduction of a reaction gas comprising a silicon-containing component and hydrogen through one or more nozzles into a reactor comprising at least one heated filament rod on which silicon is deposited, wherein an Archimedes number Arn, which describes flow conditions in the reactor as a function of a fill level FL which states a ratio of a rod volume to an empty reactor volume in percent, for a fill level FL of up to 5% is within a range limited at a lower end by a function Ar=2000×FL−0.6 and at an upper end by a function Ar=17000×FL−0.9, and at a fill level of greater than 5% is within a range from at least 750 to at most 4000. |
地址 |
Munich DE |