发明名称 PLASMA ELECTRON FLOOD FOR ION BEAM IMPLANTER
摘要 <p>A plasma electron flood system, comprising a housing configured to contain a gas, and comprising an elongated extraction slit, and a cathode and a plurality of anodes residing therein and wherein the elongated extraction slit is in direct communication with an ion implanter, wherein the cathode emits electrons that are drawn to the plurality of anodes through a potential difference therebetween, wherein the electrons are released through the elongated extraction slit as an electron band for use in neutralizing a ribbon ion beam traveling within the ion implanter.</p>
申请公布号 KR101464484(B1) 申请公布日期 2014.11.24
申请号 KR20107012396 申请日期 2008.11.06
申请人 发明人
分类号 H01J3/00;H01J37/02;H01J37/077;H01J37/317 主分类号 H01J3/00
代理机构 代理人
主权项
地址