发明名称 GAS SPRAYER AND THIN FILM DEPOSITING APPARATUS HAVING THE SAME
摘要 Disclosed are a gas injector capable of reducing the process time and forming a uniform thin film, and a thin film depositing apparatus having the same The gas injector comprises an upper plate and a lower plate. The upper plate includes multiple first gas inlets. The lower plate, which is combined with the upper plate and fors a diffusion space therein, and includes multiple first gas injection holes for spraying the gas which exists in the diffusion space by being injected through the multiple first gas inlets. Moreover, the first gas inlets can be arranged symmetrically with each other.
申请公布号 KR20140134391(A) 申请公布日期 2014.11.24
申请号 KR20130054139 申请日期 2013.05.14
申请人 AVACO CO., LTD. 发明人 HWANG, BYEONG EOK;JANG, SEUNG HYUN;KIM, KYUNG HAN;CHOI, WOO JIN;KIM, JONG HAK
分类号 C23C16/455;C23C16/44;H01L21/205 主分类号 C23C16/455
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