| 摘要 |
<p>Device for heating a substrate for crystallizing a material on the substrate, provided with a process chamber which is provided with a first and a second sealable opening for a substrate to pass through, a first inlet for receiving a process gas and a first outlet for discharging an off-gas from the process chamber; an evaporator device for evaporating the material, which evaporator device is connected to the process chamber for supplying the process gas; a first condensation device which is connected to the process chamber for receiving the off-gas and wherein the first condensation device is designed to condense the material in the vapour phase in the off-gas to form a solid phase and a second condensation device for condensing part of the material in vapour phase in the off-gas to form a liquid phase, which second condensation device connects the first condensation device to the discharge duct and a connecting duct between the evaporator device and the second condensation device for transporting the material in the liquid phase between the second condensation device and the evaporator device.</p> |
