| 摘要 |
The present invention provides a plasma processing device including a high frequency power supply capable of easily responding to high output. A first high frequency power supply part (65) includes a power supply control part (130), the high frequency power supply (140), and a combiner (150). Multiple amplifying parts (142) are connected to the combiner (150) in parallel and high frequency power amplified by each of the amplifying parts (142) is synthesized. Also, the combiner (150) is connected to a matching box (63) and the high frequency power synthesized by the combiner (150) is fed to a shower head (31) functioning as an upper electrode through the matching box (63). |
