| 摘要 |
<p>An object of the present invention is to provide an etching liquid composition and etching method which, when collectively etching a multilayer film formed of an indium oxide-based coating film and a metal-based coating film, do not produce a large step between the indium oxide-based coating film and the metal-based coating film, cause little thinning of fine wires formed of the indium oxide-based coating film and the metal-based coating film, and can achieve etching with good linearity. The etching liquid composition of the present invention contains a ferric ion component; a hydrogen chloride component; and a component that is at least one type of compound selected from the group consisting of a compound represented by general formula (1) below and a straight chain or branched chain alcohol having 1 to 4 carbon atoms:
wherein R 1 and R 3 are each independently a hydrogen atom or a straight chain or branched chain alkyl group having 1 to 4 carbon atoms, R 2 is a straight chain or branched chain alkylene group having 1 to 4 carbon atoms, and n is a number between 1 and 3.</p> |
