| 摘要 |
PROBLEM TO BE SOLVED: To improve exposure accuracy for a substrate.SOLUTION: An exposure device comprises: a spot liquid immersion device for forming a liquid immersion region 14 under a projection optical system PL by using liquid supplied through a nozzle unit 32; a stage system which includes a table WTB for holding a substrate W and a motor for driving the table WTB, and is capable of moving the substrate in six degree-of-freedom directions; mark detection systems AL1, AL2to AL2for detecting a mark of the substrate; a measurement device which includes a plurality of sensors (64, 66, 72, 74, 76) for respectively irradiating scale members (39Y, 39Y, 39X, 39X) having a reflection type lattice with measurement beams, and measures positional information on the table with respect to the six degree-of-freedom directions; and a control device for controlling the stage system according to the measured positional information. The measurement device measures positional information on the table in the case of operation of exposing the substrate and operation of detecting the mark of the substrate. |
