| 发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD, EACH USING THE COMPOSITION |
| 摘要 |
An actinic ray-sensitive or radiation-sensitive resin composition contains a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1) (in the formula, M11 represents a single bond or a divalent linking group; Q11 represents an alkyl group, a cycloalkyl group, or an aryl group).; |
| 申请公布号 |
US2014342275(A1) |
申请公布日期 |
2014.11.20 |
| 申请号 |
US201414452093 |
申请日期 |
2014.08.05 |
| 申请人 |
FUJIFILM Corporation |
发明人 |
INASAKI Takeshi;KAWABATA Takeshi;TSUCHIMURA Tomotaka;TSUCHIHASHI Toru |
| 分类号 |
G03F7/038;C08F261/02;G03F7/20 |
主分类号 |
G03F7/038 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:
a compound (P) that contains at least one phenolic hydroxyl group and at least one group in which a hydrogen atom of a phenolic hydroxyl group has been substituted with a group represented by the following General Formula (1), wherein in the formula, M11 represents a single bond or a divalent linking group; and Q11 represents an alkyl group, a cycloalkyl group or an aryl group. |
| 地址 |
Tokyo JP |
