SUBSTRATE CLEANING DEVICE, SYSTEM AND METHOD

摘要

Disclosed is a substrate cleaning device. The substrate cleaning device comprises a water tank (1), a water pump (2) connected to the water tank (1), a plurality of nozzles (3) connected to the water pump (2) wherein a fluid flowing from the plurality of nozzles (3) is sprayed onto a substrate (5), and also heaters (11, 12) which are arranged in the substrate cleaning device for heating the fluid before the fluid flows from the nozzles (3). Also disclosed are a cleaning system comprising the cleaning device and a cleaning method. Because of the heating of the heaters, the temperature of the fluid for cleaning the substrate can be increased so that the molecular movement in the fluid is accelerated, thereby increasing the solubility of foreign organic matters in the fluid, improving the removing probability of the foreign organic matters, and in turn improving the product yield.