| 摘要 |
The purpose of the present invention is to provide a means which is capable of improving the polishing rate and the polishing selectivity of a phase change compound. The present invention is a polishing composition which contains: an organic compound having three or more hydroxy groups; a brittle film-forming agent and/or an agent that exerts a chelating function on at least one component of a phase change compound; and an oxidant. |
