发明名称 ELEMENTS GROWN ON NONPOLAR OR SEMIPOLAR (Ga, Al, In, AND B)N SUBSTRATES
摘要 <p>PROBLEM TO BE SOLVED: To provide elements grown on nonpolar or semipolar (Ga, Al, In, and B)N substrates.SOLUTION: A method improves growth morphology of (Ga, Al, In, and B)N thin films on nonpolar or semipolar (Ga, Al, In, and B)N substrates. A (Ga, Al, In, and B)N thin film is grown directly on a nonpolar or semipolar (Ga, Al, In, and B)N substrate or a template and a portion of carrier gas used during growth is composed of an inert gas. Nonpolar or semipolar nitride LEDs and diode lasers may be grown on the smooth (Ga, Al, In, and B)N thin films grown by the present invention.</p>
申请公布号 JP2014220531(A) 申请公布日期 2014.11.20
申请号 JP20140166443 申请日期 2014.08.19
申请人 REGENTS OF THE UNIV OF CALIFORNIA 发明人 ROBERT M FARRELL;MICHAEL IZA;JAMES S SPECK;DENBAARS STEVEN P;NAKAMURA SHUJI
分类号 H01L21/205;C30B29/38;H01L33/16;H01L33/32 主分类号 H01L21/205
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