发明名称 VAPOR DEPOSITION MASK, VAPOR DEPOSITION MASK PREPARATION BODY, AND MANUFACTURING METHOD FOR ORGANIC SEMICONDUCTOR ELEMENT
摘要 <p>PROBLEM TO BE SOLVED: To provide a vapor deposition mask that is both higher in precision and lightweight even when made large-sized and can form a high-precision vapor deposition pattern while maintaining strength, a vapor deposition mask manufacturing method and a vapor deposition mask preparation body such that the vapor deposition mask can be easily manufactured, and a manufacturing method for organic semiconductor element in which a high-precision organic semiconductor element can be manufactured.SOLUTION: A metal mask 10 provided with a plurality of slits 15 and a resin mask 20 are stacked, and the resin mask 20 is provided with opening parts 25 needed for constituting a plurality of screens. The opening parts 25 correspond to a pattern to be manufactured by vapor deposition, and each slit 15 is provided at a position where the slit overlaps at least one entire screen.</p>
申请公布号 JP2014218750(A) 申请公布日期 2014.11.20
申请号 JP20140160128 申请日期 2014.08.06
申请人 DAINIPPON PRINTING CO LTD 发明人 TAKEDA TOSHIHIKO;OBATA KATSUYA;OCHIAI HIROMITSU
分类号 C23C14/04;C23C14/12;H01L51/50;H05B33/10 主分类号 C23C14/04
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