发明名称 PATTERN FORMATION METHOD
摘要 A pattern formation method for forming a micropattern includes a first step of causing a first pattern-formable area at which a first pattern is to be formed on a liquid-repellent, first film that is formed on a substrate and that has a lyophilic/lyophobic variable function to be lyophilic and to reduce in thickness; a second step of forming a second film having a flat surface on the first film; and a third step of forming the first pattern at the first pattern-formable area by drying the second film.
申请公布号 US2014342574(A1) 申请公布日期 2014.11.20
申请号 US201414452727 申请日期 2014.08.06
申请人 FUJIFILM Corporation 发明人 MIYAMOTO Kimiaki
分类号 H01L21/033 主分类号 H01L21/033
代理机构 代理人
主权项 1. A pattern formation method for forming a micropattern, comprising: a first step of causing a first pattern-formable area at which a first pattern is to be formed on a liquid-repellent, first film that is formed on a substrate and that has a lyophilic/lyophobic variable function to be lyophilic and to reduce in thickness; a second step of forming a second film having a flat surface on the first film; and a third step of forming the first pattern at the first pattern-formable area by drying the second film.
地址 Tokyo JP
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